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From Lab to Application: Magnetron Sputtering Preparation of Non-Evaporable Getter (NEG) Films

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From Lab to Application: Magnetron Sputtering Preparation of Non-Evaporable Getter (NEG) Films

We utilize magnetron sputtering to fabricate Non-Evaporable Getter (NEG) films. After activation, these films can maintain ultra-high vacuum (10-10(上標) Torr) without pumps, with activation temperatures below 200 °C. Once activated, the getter films absorb residual gases in the vacuum system to achieve the desired vacuum level. Common residual gases include H2(下標), H2(下標)O, CO, and CO2(下標).

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  • Pavilion:Future Tech Program Results of Juristic Person FC01

  • Affiliated Ministry:National Science and Technology Council

  • Application Field:Electronics & Optoelectronics

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  • Technology maturity:Trial production

  • Exhibiting purpose:Display of scientific results

  • Trading preferences:Negotiate by self

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