In the 2nm node semiconductor process, GAA three-dimensional structures face challenges such as new materials and require super high resolution monitoring to ensure process yields. The team develops this 2 nm node front-end metrology tool based on X-ray technology. The XRCD metrology tool measures multilayer GAA structures and monitors critical dimensions with atomic-level resolution, reducing measurement time by 90％. The target market includes foundry and memory below N2 process node. The market is expected to be USD 130 million in 2025, with an annual growth rate of 36.8％.