Deposition of Metal-Organic Framework Thin Films for Low-k Devices
Technology Introduction:
This technology uses ALD-derived metal oxide layers as metal sources and adhesion templates, followed by vapor-phase or solution-phase conversion to form wafer-scale MOF low-k thin films for advanced semiconductor dielectric applications.
Industrial Applications:
This technology is applicable to BEOL low-k dielectrics, insulating layers, barrier layers, and advanced packaging, with potential to reduce RC delay, leakage current, and power consumption in wafer-level semiconductor integration.
National Taiwan University
At present, the University consists of 16 colleges, 58 departments, 146 graduate institutes, as well as 34 Master's and PhD degree programs. NTU's programs cover a wide array of disciplines across science, arts, and the humanities, with up to 8,000 courses made available for selection each semester.
Contact Information
Name：Dun-Yen Kang
Tel：02-3366-1767
Address：No. 1, Sec. 4, Roosevelt Rd., Taipei 10617, Taiwan (R.O.C.)
