Photon-Induced Atomic Layer Deposition
Technology Introduction:
Photon-Induced Atomic Layer Deposition (PI-ALD) is the world's only technology to incorporate photocatalytic reactions intothin-film deposition, solving the critical trench-filling challenge in advanced processes while enabling precisely controlledarea-selective deposition. Films deposited via PI-ALD achieve lower surface roughness, fewer residual impurities (C, O),lower resistivity, and faster deposition rates.
Industrial Applications:
PI-ALD uses UV or visible light to activate precursor reactions, enabling low-temperature, area-selective deposition. Key applications include selective deposition and self-aligned patterning in advanced semiconductor processes,low-thermal-budget encapsulation for flexible electronics and OLEDs, and photocatalysis, sensors, and transparent conductive films.
National Tsing Hua University
National Tsing Hua University (NTHU), established in 1911 and located in Hsinchu, Taiwan, is one of the top research universities in the country. NTHU offers a wide range of programs in fields such as engineering, science, management, and humanities. The university is known for its strong emphasis on innovation, research excellence, and fostering global perspectives. With a commitment to academic rigor and interdisciplinary collaboration, NTHU plays a key role in advancing knowledge and technological development, contributing to both Taiwan’s growth and the global academic community.
Contact Information
Name：Yen, Jui-Kang
Tel：03-562-1080
Address：No. 101, Section 2, Kuang-Fu Road, Hsinchu City
