Semiconductor Angstrom-level Surface Smoothing Technology: Microwave Chemical Mechanical Polishing
Silicon carbide (SiC) is ideal for net-zero emission tech due to its wide bandgap but faces polishing challenges due to its hardness. General polish techniques struggle with efficiency, cost, and environmental impact. This new technology uses microwave irradiation, eliminating the need for heavy metals or catalysts, and enhances SiC polishing by activating electron redox reactions at the solid-liquid interface, making it more sustainable and advancing eco-friendly semiconductor manufacturing.
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Technology maturity：Prototype
Exhibiting purpose：Display of scientific results
Trading preferences：Negotiate by self
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