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Semiconductor Angstrom-level Surface Smoothing Technology: Microwave Chemical Mechanical Polishing

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Semiconductor Angstrom-level Surface Smoothing Technology: Microwave Chemical Mechanical Polishing

Silicon carbide (SiC) is ideal for net-zero emission tech due to its wide bandgap but faces polishing challenges due to its hardness. General polish techniques struggle with efficiency, cost, and environmental impact. This new technology uses microwave irradiation, eliminating the need for heavy metals or catalysts, and enhances SiC polishing by activating electron redox reactions at the solid-liquid interface, making it more sustainable and advancing eco-friendly semiconductor manufacturing.

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  • Pavilion:Future Tech Evolutionary Materials & Chemical FJ07

  • Affiliated Ministry:National Science and Technology Council

  • Application Field:Materials & Chemical Engineering & Nanotech

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  • Technology maturity:Prototype

  • Exhibiting purpose:Display of scientific results

  • Trading preferences:Negotiate by self

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