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Atomic Layer Pitch Splitting: a breakthrough equipment solution for advanced semiconductor manufacturing.

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Atomic Layer Pitch Splitting: a breakthrough equipment solution for advanced semiconductor manufacturing.

Technology Introduction:
AlixLabs' unique and patented Atomic Layer Pitch Splitting (APS) is a novel plasma-based etching method that selectively targets surface topology. This breakthrough technology eliminates several complex steps in chip manufacturing, enabling more efficient, cost-effective, and sustainable semiconductor production.
Industry Applicability:
APS enables cost-efficient scaling of semiconductor devices by doubling pattern density. It reduces manufacturing costs, lowers energy use, and supports sustainable, high-volume production. Applicable in logic, memory, and power devices, APS accelerates industrial adoption with scalable chip manufacturing.

AlixLabs AB

"AlixLabs is a Swedish semiconductor industry supplier with equipment and processes capable of manufacturing nanostructures with characteristic sizes smaller than 20 nanometers. We enable energy efficient fabrication of structures beyond the resolution limits of optical and electron beam lithography – through APS™."

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  • Phone:+46736541476

  • Address:SWEDEN

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Other Information

  • Pavilion:Future Tech IC Innovation and Applications FK20

  • Affiliated Ministry:National Science and Technology Council

  • Application Field:Materials & Chemical Engineering & Nanotech

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Patent

  • 16084992

    • Patent Name
    • Application Country
    • Patent type
    • Assignee
    • Application Number
    • Publish Number
    • Patent Name

      Method for selective etching of nanostructures

    • Application Country

      Taiwan

    • Patent type

      Utility Invention

    • Assignee

      AlixLabs

    • Application Number

      16084992

    • Publish Number

      16084992

Website & Links

  • Technology maturity:Prototype

  • Exhibiting purpose:Product promotion

  • Trading preferences:New products development

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