Extreme Ultraviolet High Reflectivity Mirror Coating Technology
Technology Introduction:
EUV (extreme ultraviolet) reflective mirrors are critical components in advanced lithography systems. The EUV mirror developed by NCIR consists of tens of alternating nanoscale multilayers of molybdenum (Mo) and silicon (Si). These multilayers require ultra-high-precision design and deposition control to form a well-defined periodic structure, enabling high reflectivity. In the future, this technology will be implemented in the optical collection system of NCIR’s standalone EUV wavelength inspection platform, demonstrating its critical value in high-precision optics and advanced semiconductor manufacturing.
Industrial Applications:
This technology supports advanced semiconductor EUV lithography processes, serving as a critical optical component for the fabrication of chips at the 5-nanometer node and beyond. It can also be applied to EUV light source inspection, optical calibration, and metrology systems, thereby improving process monitoring accuracy. Furthermore, its high-precision nanoscale multilayer coating and surface control technologies can be extended to high-end precision optics, scientific instrumentation, and extreme ultraviolet (EUV) application equipment. These capabilities demonstrate strong potential for integration into the core semiconductor supply chain and for high-value-added applications.
National Applied Research Laboratories
The main missions of NIAR are:
To establish R&D platforms
To support academic research
To promote frontier science and technology
To foster high-tech talent
To establish R&D platforms
To support academic research
To promote frontier science and technology
To foster high-tech talent
Contact Information
Name：Wen-Hao Cho
Tel：03-577-9911#641
Address：20, R&D Rd. VI, Hsinchu Science Park, Hsinchu City 300092, Taiwan
