We exploit deep learning techniques to develop EDA tools for semiconductor manufacturing. Our EDA tools can predict circuit shape distortions caused by the lithography processes and thus assess the photomask correction results at an early stage. These tools can be applied to layout's OPC simulation, layout hotspot detection, IC defect detection, and photomask optimization.
學研單位
Emerging Two-Dimensional Perovskite Indoor Photovoltaics for Children Healthcare System Based on Internet of Things Technologies
Development of lead-free triaxial piezoelectric MEMS accelerometer system with extremely low power consumption
High Entropy Alloy Nitride Hard Coatings Prepared by Cathodic Arc Deposition and Their Applications of Micro End Mills
Magnetic and 2D metallic Nanoparticle Arrays of Surface-Enhanced Raman Spectroscopy (SERS) Detection Platform for Environmental-Biomedical Sensing
Technology maturity：Experiment stage
Exhibiting purpose：Display of scientific results
Trading preferences：Negotiate by self
Coming soon!