The Micro-Detector Array (MDA) aims to monitor the uniformity of dosage in various processes, including EUV, DUV, e-Beam, and Ion-Beam. The MDA is capable to measure critical dimensions, image log slope, and pattern edge location. Meanwhile, MDA is fully compatible with logic process, which provides advantages of high contrast in intensity, wide dynamic range, built-in calibration, and instant WAT analysis. These features enable the MDA to monitor process parameter variation.
Advanced Automatic Detection Technology for EL Inspection and IR Ther mal Defects in Solar Modules
Hybrid CMOS Inverter Comprised of Thin Film Transistors with Hetero-channel for Monolithic 3D-ICs and Ultra-high Resolution Flat-Panel Displays Applications
Energy-Efficient Optimization Problem Decision: Neural Network-based In-Memory Annealing Units for Route Scheduling and Genome Assembly
Refining area at 1600°C: Advanced synchrotron X-ray views into the black box of blast furnaces, understands ironmaking process, and illuminates the bright road to net-zero carbon emissions
Technology maturity：Prototype
Exhibiting purpose：Display of scientific results
Trading preferences：Negotiate by self
Coming soon!