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Development of In-line Wafer-level High Aspect Ratio TSV Inspection Technology

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Development of In-line Wafer-level High Aspect Ratio TSV Inspection Technology

3D IC is a three-dimensional stacking and packaging process that realizes lower latency and high speed. The CMS of ITRI adopts the world’s first high aspect ratio (>30) Through Silicon Via (TSV) inspection technology, which is different from traditional optical inspection technology that can only reach the aspect ratio of 10. It solves the problem that the industry can only use destructive inspection in high aspect ratio silicon vias.

Contact

  • Name:Hung-Ming Tai

  • Phone:35732295

  • Address:

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Other Information

  • Pavilion:Innovation Pilot Discovering Technology Treasures

  • Affiliated Ministry:Department of Industrial Technology,MOEA

  • Application Field:Electronics & Optoelectronics

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  • Technology maturity:Trial production

  • Exhibiting purpose:Product promotion、Display of scientific results

  • Trading preferences:Exclusive license/assignment

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